Low Pressure Plasmas

Low pressure inductively coupled discharges are widely used in the microelectronics industry for the etching of microstructures.  There is a generally good understanding of the fundamental physical and chemical processes in such  systems when only positive ions and electrons are present however when negative ions are also present some unique phenomena are observed which are still not fully understood.

Our current activities focus on  the studies of instabilities in such systems along with measurements of atomic and negative ion concentrations. We also intend to shortly reestablish our  work on atom sticking coefficients and electron energy distribution functions (eedf).