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Wet Processing

Wet Processing

 

Silicon substrate cleaning

  • Megasonically agitated SC1 solution for particulate removal
  • Heated SC2 solution to remove contamination
  • Pihrani H2SO4:H2O2 clean

Silicon wet etching

  • HF/buf HF
  • KOH

Metals wet etch

  • Copper
  • Tungsten
  • Titanium
  • Chromium etc