Wet Processing

 

Silicon substrate cleaning

• Megasonically agitated SC1 solution for particulate removal
• Heated SC2 solution to remove contamination
• Pihrani H₂SO₄:H₂O₂ clean

Silicon wet etching

• HF/buffered HF
• KOH

Metals wet etch

• Copper
• Tungsten
• Titanium
• Chromium etc